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and wafer size transition
SEMI E49-0702 (technical revision)
and the lifetime measurement is in many cases done without any surface passivation or without confirming that the surface passivation is perfect
it makes sense to use the same wafer support configuration when measuring TTV
SEMI E76-0299 (technical revision)
E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1017 and wafer size transitionNOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI Standards in 2003. The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool. Referenced SEMI Standards SEMI M10
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